[PDF] Ion Impantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006 (AIP Conference Proceedings Accelerators, Beams, and Instrumentations) Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers

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This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.

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